Figure 4
From: Tuning piezoelectric properties through epitaxy of La2Ti2O7 and related thin films
XRD patterns of La2Ti2O7 deposited on rutile TiO2(110) at 925–950 °C. (a) Curve (i) as-deposited with unidentified phase marked with *; (ii) film from (i) after annealing 1000 °C/8 h in air, with the 〈00l〉 orientation of La2Ti2O7 marked with +; (iii) Film deposited on Nb-doped TiO2(110) and annealed at 1000 °C/8 hrs in air. (b) μ−XRD powder scan of film (iii), confirming the presence of La2/3TiO3. Positions of expected La2Ti2O7 peaks are marked with +. (c) Rutile(211) pole figure. (d) La2/3TiO3(112) pole figure. Pole figures collected with μ-XRD; gray shading in the center of the figures indicates the region where no data was collected.
