Table 2 Average of measured work function differences for Ar, Kr and Xe atoms adsorbed to substrates of Au, Ag and Cu from Hückstädt et al.23. The work function difference is for a mono layer of adsorbate compared to a clean substrate surface.

From: Schottky model for triboelectric temperature dependence

 

Ar

Kr

Xe

Au(111) substrate

0.38 ± 0.03 eV

0.42 ± 0.02 eV

0.53 ± 0.03 eV

Ag(111) substrate

0.40 ± 0.03 eV

0.46 ± 0.02 eV

0.59 ± 0.03 eV

Cu(111) substrate

0.42 ± 0.03 eV

0.49 ± 0.03 eV

0.62 ± 0.03 eV

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