Figure 3 | Scientific Reports

Figure 3

From: Biomimetic Moth-eye Nanofabrication: Enhanced Antireflection with Superior Self-cleaning Characteristic

Figure 3

(a–c) AFM images of AR sub-wavelength structures fabricated using ultraviolet nanoimprint lithography process with an imprinting force of: (a) 150 N, (b) 250 N, and (c) 350 N (Typical three-dimensional image (left), two-dimensional top view image (middle), and line profile image (right) using AFM); (d,e) Three-dimensional AFM images of AR sub-wavelength structures fabricated using UV-curable resins with different viscosities of: (d) 400 cps and (e) 800 cps.

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