Figure 2
Schematic and SEM photographs of the fabricated lasers. (a) Schematic of ridge lasers fabricated on the Si substrate. Different materials and layers are denoted in the order of their appearance in the structure by the color code shown in the right. (b) SEM image of the fully processed wafer. Contact pads correspond to the scheme presented in Fig. 1a. (c) SEM image of the cleaved facet of the laser demonstrating an asymmetric shape of the ridge formed by anisotropic wet etching of the misoriented structure. Crystallographic directions and a schematic of atomic plane steps induced by the miscut of the substrate are also shown.
