Table 1 Process flow of nine samples.
Number/name | First step - micro structure fabrication | Second step - nano structure fabrication |
|---|---|---|
1/wet-tip | Dry etching by ICP | Metal-assisted wet chemical etching |
2/wet-pit | Dry etching by ICP | Metal-assisted wet chemical etching |
3/wet-flat | No treatment | Metal-assisted wet chemical etching |
4/dry-tip | Dry etching by ICP | Dry etching by ICP |
5/dry-pit | Dry etching by ICP | Dry etching by ICP |
6/dry-flat | No treatment | Dry etching by ICP |
7/tips | Dry etching by ICP | No treatment |
8/pits | Dry etching by ICP | No treatment |
9/silicon | No treatment | No treatment |
