Figure 3
From: Adaptable, illumination patterning light sheet microscopy
Light sheet simulations (NAill = 0.3, immersion media refractive index, nimm = 1.33, λill,0 = 488 nm). (a) The x, y intensity profile of (i) a y-scanned light sheet (z = 0 μm). (ii) The z-projection of the light sheet. (iii) The z-projection of the light sheet using a confocal slit 7.25 μm wide (confocal slit widths are defined in object space throughout). (b) y-averaged intensity along the propagation axis of the z-projected light sheet (apparent patterning resolution in (x) from (a) (iii) with a varying slit width (from widest to narrowest: widefield (no-slit), 3.25, 5.25, 7.25, 9.25 and 11.25 μm). (c) The x, z profile of (i) the y-projection of a y-scanned light sheet. (ii) The same but using a confocal slit 7.25 μm wide. (iii) The light rejected by the confocal slit (6 × intensity shown for ease of visualization). (d) Apparent patterning resolution (FWHM) from the z-projected light sheet, optical sectioning and optical efficiency for various slit widths.
