Figure 3
From: Polarization-sensitive tunable absorber in visible and near-infrared regimes
(a) Cross-sectional SEM image of fabricated tunable absorber. On the glass substrate, thin Cr layer and SiO2 were deposited using electron beam evaporation, then an Au grating with 200 nm period was patterned on the SiO2 layer by nanoimprint lithography. To get a clear SEM image, platinum (Pt) is deposited on the Au grating and cut using dual-beam focused ion beam milling system (Helios Nanolab G3 CX, FEI). (b) Measurement setup for broadband tunable absorber. A microscope connected to the spectrometer is used to capture transmittance T and reflectance R spectra. The polarization of incidence light is controlled using a linear polarizer.
