Figure 1
(a) Schematics of the first step of the sequential track etching irradiation process, which consists in a first irradiation exposure of the PC film at the two fixed incidence angles of −25° and +25° relative to the OOP direction. (b) For the second irradiation step the PC film is rotated in the x-y plane by 90° and re-exposed to the irradiation flux at the same fixed angles with respect to the OOP direction. SEM images of electrodeposited at a deposition potential of −1 V of (c) a Ni CNW network and (d) a Ni CNT network obtained after the complete dissolution of the PC nanoporous host template. Close magnification views of the CNT network, showing (e) the tubular structure and crossing zones of the nanotubes and (f) sharp details of the nanotubes where an average wall thickness of 37 nm has been obtained. The dotted lines are guides for the eye.
