Table 1 Chemical composition and nanoindentation data for Re0.85B2 and (Re0.67Al0.10)B2 films.

From: Self-passivating (Re,Al)B2 coatings synthesized by magnetron sputtering

Sample

at.% B

at.% Al

H (GPa)

E (GPa)

EDFT(GPa)

h (nm)

D (μm)

Rq (nm)

Re0.85B2

70.1

0.0

32(9)

522(134)

667

90(17)

1.52(6)

38(1)

(Re0.67Al0.10)B2

72.4

3.5

40(5)

562(56)

621

72(8)

1.83(9)

18(2)a

  1. The columns display B and Al concentrations, average values of measured (standard deviation on the last significant digit is given in parenthesis) hardness, H, elastic modulus, E, indentation depth, h, film thickness, D, and root mean square surface roughness, Rq.
  2. aResolution of the microscope is given as 20 nm. The stated value might overestimate the actual Rq.
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