Figure 5
From: Modulating the Work Function of Graphene by Pulsed Plasma Aided Controlled Chlorination
Photograph (a) and schematic (b) for the experimental setup of pulsed plasma treatment. Schematic illustration for the KPFM model used for investigating GG@CH2Cl2, GG@CHCl3 and GG@CCl4. VT presents the recorded contact potential. Brighter region indicates higher recorded contact potential difference. A lower VT represents a higher work function.
