Figure 4
From: A new decomposition mechanism for metal complexes under water-oxidation conditions
Spectroelectrochemistry in the presence of Ni phet and Ni foam (a). The conditions: in the phosphate buffer (5.0 mL;0.25 M) at pH = 11.0 (amperometric conditions: 1.60 V). The absorption at 600 nm for water-oxidation reaction in the presence of a bare FTO, NiOx/FTO and Ni foam (b). Spectroelectrochemistry in the presence of Mn spor and Mn chips (c). The conditions: in the phosphate buffer (5.0 mL; 0.25 M) at pH = 11.0 (amperometric conditions: 0.8 V). The absorption at 460 nm for water-oxidation reaction in the presence of a bare FTO, MnOx/FTO and Mn chips (d). The conditions: in the phosphate buffer (5.0 mL; 0.25 M; at pH = 11.0; amperometric conditions: for Mn chips 0.8 V and for a bare FTO and MnOx/FTO 1.6 V). Spectroelectrochemistry in the presence of Mn spor and Mn chips (e). The conditions: in the phosphate buffer (5.0 mL; 0.25 M; at pH = 11.0; amperometric conditions: for Mn chips 1.6 V.
