Figure 1
From: Ultra-fast direct growth of metallic micro- and nano-structures by focused ion beam irradiation
Comparison of FIBID steps using precursor molecules either in the gas phase (standard FIBID) or forming a condensed layer (Cryo-FIBID). In the Cryo-FIBID process, the substrate is first cooled below the precursor condensation temperature. Then, the gaseous precursor is delivered through the gas injection system for a short time (typically a few seconds) to produce a thin layer of condensed precursor over the substrate surface. After FIB exposure of the corresponding areas, the substrate is heated to room temperature and the material remains only at the exposed areas.
