Figure 5
From: Ultra-fast direct growth of metallic micro- and nano-structures by focused ion beam irradiation
Artificially-coloured SEM micrograph of a W-C Cryo-deposit array, composed of 100 rectangles of size 4 μm × 3.85 μm, grown in a single Ga+- irradiation exposure. The total ion irradiation time was only 85 seconds, to be compared with more than 14 hours if the standard FIBID process at room temperature had been used.
