Figure 2 | Scientific Reports

Figure 2

From: Tuneable interplay between atomistic defects morphology and electrical properties of transparent p-type highly conductive off-stoichiometric Cu-Cr-O delafossite thin films

Figure 2

Electron microscopy analysis for as-deposited (top) and annealed (bottom) films. Annealing temperature: 900 °C. Annealing time: 1000 sec. (a) SEM micrographs; (b) Typical cross section scanning bright field TEM (BF-STEM). The arrows illustrate the presence of the structural defects in as-deposited films and the contrasted 3D islands in annealed film; (c) high resolution images. The arrows indicate the thicknesses of the epitaxial layer and a typical twinned domain is as-deposited film. Inset: corresponding FFT patterns.

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