Table 2 AMSEs of waveguide stress symmetry.
From: Control of Laser Induced Cumulative Stress for Efficient Processing of Fused Silica
90 mW | 110 mW | 130 mW | |
|---|---|---|---|
Multiscan | 2.75 nm2 | 14.02 nm2 | 19.85 nm2 |
Halfscan | 0.48 nm2 | 0.32 nm2 | 2.12 nm2 |
From: Control of Laser Induced Cumulative Stress for Efficient Processing of Fused Silica
90 mW | 110 mW | 130 mW | |
|---|---|---|---|
Multiscan | 2.75 nm2 | 14.02 nm2 | 19.85 nm2 |
Halfscan | 0.48 nm2 | 0.32 nm2 | 2.12 nm2 |