Figure 6
From: Low-frequency noise induced by cation exchange fluctuation on the wall of silicon nitride nanopore
(a) Schematic images of the low-frequency noise measurement procedure including the following three steps: (i) nanopore fabrication by utilizing dielectric breakdown in a MClx aqueous solution, (ii) replacement with a CsCl aqueous solution, and (iii) measurement of the CsCl ionic current through the nanopore at 0.3 V. (b) Low-frequency noise magnitudes (\({S}{}_{{\rm{10Hz}}}^{{\rm{M}}\to {\rm{Cs}}}\)/I2) of the CsCl ionic currents through the nanopores fabricated by utilizing dielectric breakdown in MClx aqueous solutions.
