Figure 6

Implied Voc of a-Si:H/SiOx/c-Si structures fabricated on CMP, KOH-etched, and pyramid-textured c-Si surface annealed at various temperatures for different durations.

Implied Voc of a-Si:H/SiOx/c-Si structures fabricated on CMP, KOH-etched, and pyramid-textured c-Si surface annealed at various temperatures for different durations.