Figure 7
From: Nano-scale depth-varying recrystallization of oblique Ar+ sputtered Si(111) layers

Amorphous content and relative stress for amorphized samples as a function of off-normal incidence.
From: Nano-scale depth-varying recrystallization of oblique Ar+ sputtered Si(111) layers

Amorphous content and relative stress for amorphized samples as a function of off-normal incidence.