Table 3 Magnitude of SY and energy transferred to recoils for different angle of incidences.
From: Nano-scale depth-varying recrystallization of oblique Ar+ sputtered Si(111) layers
Angle of incidence (°) | Sputtering yield (Si atoms/Ar+ ion) | Energy transferred to recoils |
|---|---|---|
30 | 0.96 | 70 |
40 | 1.35 | 80 |
50 | 2.16 | 100 |