Figure 7

Measured XRR data for the (a) 19-nm-thick IZTO films on SiO2/Si substrates annealed at 350 and 700 °C and (b) 700 °C-annealed IZTO films with different thicknesses of 10, 19, 30, and 50 nm.

Measured XRR data for the (a) 19-nm-thick IZTO films on SiO2/Si substrates annealed at 350 and 700 °C and (b) 700 °C-annealed IZTO films with different thicknesses of 10, 19, 30, and 50 nm.