Figure 2
From: High-temperature etching of SiC in SF6/O2 inductively coupled plasma
Plots of SiC etching rate (red line, circular dots) and SiC Rms (black line, square dots) on substrate holder surface temperature.
Figure 2 | Scientific Reports
From: High-temperature etching of SiC in SF6/O2 inductively coupled plasma
Plots of SiC etching rate (red line, circular dots) and SiC Rms (black line, square dots) on substrate holder surface temperature.
