Figure 2 | Scientific Reports

Figure 2

From: Simultaneous photoadhesion and photopatterning technique for passivation of flexible neural electrodes based on fluoropolymers

Figure 2

Effects of Ar RF plasma treatment (RF power: 40 W, working pressure: 15 mTorr) time (a) on the AS between SU-8 and fluoropolymers and (b) on the radical density of fluoropolymers. (c) FESEM surface images of FEP (top), PFA (middle), and PTFE (bottom) after various plasma treatment times. The dimension of each image is 2 μm × 2 μm. (d) Effect of Ar RF plasma power on the AS between SU-8 and fluoropolymers (plasma treatment time: 1 min). (e) The AS between SU-8 and plasma-treated FEP under milder conditions and plasma treatment times. Plasma treatment conditions are listed in the legend. (f) The AS between SU-8 and plasma-treated FEP (RF power: 10 W, plasma treatment time: 1 min) with respect to the storage time in units of days. (g) The AS of commercial negative photoresists with plasma-treated FEP (RF power: 40 W, RF plasma treatment time: 4 min). nLOF, NR9, and LTC denotes AZ nLOF 2070 (AZ), and NR9-3000PY (Futurrex), and LTC 9520 (FujiFilm), respectively.

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