Table 1 Electronic input parameters for the device simulations.
Parameter | Recombination | Resistive |
|---|---|---|
p-type (B) bulk | \(\tau _\text{n0 }\) = 2000 \(\upmu \text{s }\) | \(\rho _\text{b }\) = 0.9 \(\Omega \ \text{cm }\) |
\(\tau _\text{p0 }\) = 20,000 \(\upmu \text{s }\) | ||
n-type (P) bulk | \(\tau _\text{b }\) = 22,000 \(\upmu \text{s }\) | \(\rho _\text{b }\) = 3 \(\Omega \ \text{cm }\) |
Pas. on p-Si (plan.) | \(J_\text{0 }\) = 1\(\text{fA } / \text{cm}^2\) | n.a. |
Pas. on p-Si (text.) | \(J_\text{0 }\) = 3\(\text{fA } / \text{cm}^2\) | n.a. |
Pas. on n-Si | \(J_\text{0 }\) = 3 \(\text{fA } / \text{cm}^2\) | n.a. |
emitter P-diff. | \(J_\text{0 }\) = 22 \(\text{fA } / \text{cm}^2\)25 | \(R_\text{s }\) = 133 \(\Omega /\square\)25 |
selective P-diff. | \(J_\text{0 }\) = 100 \(\text{fA } / \text{cm}^2\) | \(R_\text{s }\) = 95 \(\Omega /\square\) |
emitter B-diff. | \(J_\text{0 }\) = 14 \(\text{fA } / \text{cm}^2\)26 | \(R_\text{s }\) = 135 \(\Omega /\square\)26 |
selective B-diff. | \(J_\text{0 }\) = 110 \(\text{fA } / \text{cm}^2\)27 | \(R_\text{s }\) = 95 \(\Omega /\square\)27 |
n-type POLO | \(J_\text{0 }\) = 3 \(\text{fA } / \text{cm}^2\)22 | \(R_\text{s }\) = 50 \(\Omega /\square\) |
p-type POLO | \(J_\text{0 }\) = 5 \(\text{fA } / \text{cm}^2\) | \(R_\text{s }\) = 200 \(\Omega /\square\) |
Ag on P cont. | \(J_\text{0 }\) = 1400 \(\text{fA } / \text{cm}^2\) | \(\rho _\text{c }\) = 1.5 \(\mathrm {m}\Omega \ \text{cm}^2\) |
Al on Si cont. | \(J_\text{0 }\) = 400 \(\text{fA } / \text{cm}^2\)28 | \(\rho _\text{c }\) = 1.3 \(\mathrm {m}\Omega \ \text{cm}^2\) |
Ag on B cont. | \(J_\text{0 }\) = 740 \(\text{fA } / \text{cm}^2\)29 | \(\rho _\text{c }\) = 2 \(\mathrm {m}\Omega \ \text{cm}^2\)30 |
Ag on n-POLO cont. | Same as n-POLO | \(\rho _\text{c }\) = 0.9 \(\mathrm {m}\Omega \ \text{cm}^2\) |
Ag on p-POLO cont. | Same as p-POLO31 | \(\rho _\text{c }\) = 5 \(\mathrm {m}\Omega \ \text{cm}^2\) |