Figure 3
From: Galvanic corrosion inhibition from aspect of bonding orbital theory in Cu/Ru barrier CMP
Interfacial interaction behaviour analysis between Cu/Ru films and nicotinic acid inhibitor. (a,b) Contact angle measurement of Cu and Ru films after dipping as a function of inhibitor concentrations at pH 10. (c–f) X-ray photoelectron spectroscopy (XPS) results for (c) Cu 2p, (d) Cu O1s, (e) Ru 3d, and (f) Ru O1s as a function of inhibitor concentrations at pH 10.
