Figure 1
(a) Schematics of the nominal and estimated actual film structures, (b) RHEED patterns of Co (lower image) and TiOx (upper image) layers, (c) cross sectional TEM image, and (d) EDX element maps (Ta, Pt, Co, Ti, and O) of nominal SiOx sub./Ta (5 nm)/Ru (10 nm)/Ta (5 nm)/Pt (10 nm)/Co (1.2 nm)/TiOx (3.8 nm)/Pt (5 nm)/Ru (2 nm) sample. The dotted white lines are visual guidelines indicating the approximate Ti and Co layer positions.
