Figure 3

(a) SEM images of electrical contact pads and markers on \({\hbox {SiO}_2 / \hbox {Si}}\) substrates. The markers are laid out on a square lattcie which define the “writing” fields (green squares) of \({8}\,\upmu \hbox {m}\) x \({8}\,\upmu \hbox {m}\). (b), (c) Individual C-shape nanowires in between source and drain electrodes. Scale bars are \({100}\hbox { nm}\). (d), (e) Temperature dependent I-V characteristics from 4.2 K to RT of C-shape wires by biasing from \({-30} \hbox { mV}\) to \({-30} \hbox { mV}\). The x-axis labels are identical for (d), (e).