Table 1 Film deposition condition.

From: Optical and surface energy probe of Hamaker constant in copper oxide thin films for NEMS and MEMS stiction control applications

Power (W)

Power density

(W/cm2)

Pressure

(mTorr)

Oxygen flow range (sccm)

200

0.6

2.0–6.0

1–4

300

0.9

2.0–6.0

1–4

400

1.2

2.0–6.0

2–6

500

1.5

2.0–6.0

2–6

600

1.9

2.0–6.0

2–6

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