Figure 1

Scheme for the synthesis of zinc oxide by atomic layer deposition (ALD). (1) Diethylzinc (DEZ) pulse injection, (2) chemisorption of DEZ upon the Si wafer surface, (3) purge of unreacted DEZ and by-products, (4) H2O pulse injection, (5) reaction of water with absorbed DEZ, and (6) purge of excess H2O and by-products.