Figure 1
From: Magnification inferred curvature for real-time curvature monitoring
Experimental configuration of the MIC system mounted on a MBE chamber in order to measure the curvature of a wafer in situ and in real-time during MBE growth (a,b). The system can be mounted either in normal incidence (a) or in tilted specular reflection incidence (b). The position of the object plane (A), the pole of the reflecting surface (P), and the focal plane of the objective lens (O) are noted in (b). (c) Shows a typical virtual image of a 1.6 × 1.6 cm2 object captured with the camera, where our software tracks the positions of luminous spots forming a 5 × 5 matrix (red rectangles).
