Figure 6
From: Magnification inferred curvature for real-time curvature monitoring
Curvature changes during a sequence of growths and growth stops of sputter-deposited Ag on a-Si as a function of time measured simultaneously with our MIC-based setup (a) and a commercial laser deflectometry-based tool (b). The MIC-based setup was mounted on the 70° viewports of the magnetron sputtering chamber while the kSA MOS was mounted at normal incidence (θ = 0°).
