Figure 2 | Scientific Reports

Figure 2

From: A nanoparticle-mist deposition method: fabrication of high-performance ITO flexible thin films under atmospheric conditions

Figure 2

Results of (i) HAADF-STEM analysis of (a) C1, (b) P1, and (c) P2. EDS mapping images ((ii) indium Kα1; (iii) tin Kα1) of the HAADF-STEM images shown in (a), (b), and (c). (iv) Images showing the positions of the line profiles for determining the distributions of In and Sn atoms in the NPs. (v) Line profiles of In and Sn atoms in the ITO NPs. The maximum intensity of 100 atom% is normalized to the point where the sum of the In and Sn intensities is the highest. The scale bar shown in (a) (iii) is common to (i)-(iii).

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