Figure 6

Cross-sectional scanning TEM images of ITO thin films prepared by the NP-mist deposition method using (a) C1 and (b) P1 on PEN substrates. The thickness was controlled to ca. 200 nm. Corresponding images of the thick films of (c) C1 and (d) P1 with thicknesses of ca. 500 nm. (e) Results of haze measurements of the (i) C1- and (ii) P1-based thin films on PEN substrates. The scale bar shown in (a) is common to (b)-(d).