Table 5 IPL energy density with respect to IPL voltage at 3 ms pulse on-time and resistivity of Cu NPs electrode and CPN electrode for each IPL energy density.

From: Fabrication of solderable intense pulsed light sintered hybrid copper for flexible conductive electrodes

IPL voltage (V)

IPL energy density (J/cm2)

Resistivity of Cu NPs electrode (μΩ∙cm)

Resistivity of CPN electrode (μΩ∙cm)

1900

3.04

2406.21 (± 277.78)

2000

3.28

431.10 (± 58.33)

2100

3.51

125.54 (± 25.12)

2783.88 (± 297.78)

2200

3.75

69.99 (± 13.89)

339.43 (± 52.78)

2300

3.99

42.21 (± 8.33)

153.32 (± 19.44)

2400

4.22

28.32 (± 2.78)

44.99 (± 8.33)

2500

4.46

22.77 (± 1.94)

19.71 (± 1.71)

2600

4.70

19.98 (± 0.56)

13.60 (± 1.11)

2700

4.94

31.10 (± 2.78)

12.93 (± 0.83)

2800

5.17

67.21 (± 8.33)

12.20 (± 0.28)

2900

5.41

347.77 (± 53.83)

16.93 (± 5.56)

3000

5.65

2606.32 (± 127.78)

44.99 (± 13.89)

3100

5.88

229.43 (± 11.11)