Table 1 Overview of the used sputtering parameters.

From: Bifunctional catalytic effect of Mo2C/oxide interface on multi-layer graphene growth

Material

Deposition pressure (E-4 mbar)

Ar (sscm)

O2 (sscm)

Current (A)

Voltage (V)

Target name (4 in.), supplier purity (%)

Mo

8.5

30

0

1

378

Mo, Robeko, 99.95

SiO2

7.8

20

20

0.25

306

Si, Sindhauser, 99.9999

TiO2

7.2

18

18

1

570

Ti, Robeko, 99.5

Al2O3

4.2

11

11

1.5

386

Al, Sindhauser, 99.99

MgO

7.9

20

20

1

172

Mg, Sindhauser, 99.95