Figure 1

Process flow for the patterning of SLG channels. (a) SLG transferred on Si/\(\hbox {SiO}_2\) substrate. (b) Coating of sample with photoresist layer. (c) SLG channel pattern defined by optical lithography. (d) SLG channel pattern after RIE. (e) Removal of residual photoresist layer from SLG surface, and the resulting SLG channel on the substrate.