Figure 2

AFM surface image and surface height distribution for Ge film deposited at He gas pressures and gas flow rates of (a) 0.1 Torr and 15 sccm, (b) 0.1 Torr and 200 sccm, and (c) 0.005 Torr and 50 sccm. All Ge films were deposited at substrate positions of 30 mm (off-axis position).