Figure 3
(a) X-ray diffraction (XRD) patterns of as-deposited BTO film and BTO films annealed at 750, 900, 1000, and 1150 °C. (b) X-ray diffraction 2θ-ω scan of the BTO (002)/(200) peaks (the area in the dashed box in (a)). Solid line indicates the experimental XRD spectrum, and the combined XRD peak is analyzed as the sum of two Gaussian curves. The triangle mark and the square mark represent the position of (002) and (200) peak, respectively. The composition ratios of each pick are expressed as a ratio of area. (c) Reciprocal space mapping (RSM) of the 224 diffraction of as-deposited BTO film and BTO films annealed at 1000, 1150 °C. The color bar represents the intensity of the measured signal. Red dashed line corresponds to the condition of strain relaxation. The black dashed line is parallel to the [001] direction.
