Figure 1
From: Macrophage-compatible magnetic achiral nanorobots fabricated by electron beam lithography
The preparation process of L-shaped nanorobots: (a) deposited Al layer through EBE, create resist patterns through EBL, and etch Al layer through ICP etching; (b) removed Al from regions not shielded by EB resist patterns; (c) deposited Ag, Ni, and Ti through EBE; (d) dissolved Al layer using NaOH and H2O2 solution to release the nanorobots.
