Figure 2
From: An angle-compensating colorimetric strain sensor with wide working range and its fabrication method
SEM images of (a–f) nanoparticles and (g–i) molds: (a–c) monolayers of (a) 780, (b) 510, (c) 356 nm nanoparticles. (d–f) monolayers of (d) 780, (e) 510, (f) 356 nm nanoparticles after RIE. (g–i) molds with periodic nanostructures from (g) 780, (h) 510, (i) 356 nm nanoparticles (scale bar 500 nm).
