Table 2 Result of calculations for XRD analysis of NiO thin films with 200 nm thickness on quartz substrate.
From: Advanced nano-texture, optical bandgap, and Urbach energy analysis of NiO/Si heterojunctions
Annealing temperature (°C) | Substrate | Angle (2\(\theta\)) (°) | Lattice parameter (Å) | FWHM (°) | Crystallite size (nm) | Strain |
|---|---|---|---|---|---|---|
– | Si | 62.80 | 4.32 | 0.465 | 20.08 | 0.34 |
– | Quartz | 42.40 | 4.26 | 0.020 | 42.05 | 0.02 |
400 | Quartz | 42.82 | 4.22 | 0.421 | 17.55 | 0.47 |
500 | Quartz | 43.07 | 4.19 | 0.442 | 16.72 | 0.49 |
600 | Quartz | 43.33 | 4.01 | 0.518 | 14.23 | 0.57 |
