Table 1 The parameters values in sputtering process.
Items | Conditions |
|---|---|
Base pressure | 3.0 × 10−5 mbar |
Deposition pressure | 8.35 × 10−3 mbar |
Sputtering gas ratio (N2/Ar) | 0.4 |
Power | 150 W |
Target-to-substrate distance | 60 mm |
Deposition time | 120 min |
Substrate temperature | 300 °C |
Substrate | Quartz |
