Figure 2 | Scientific Reports

Figure 2

From: Single-step fabrication of fibrous Si/Sn composite nanowire anodes by high-pressure He plasma sputtering for high-capacity Li-ion batteries

Figure 2

Effect of He gas pressure and sputtering-target/substrate distance on Si nanowire anodes. SEM surface and cross-sectional images of films deposited using a SiSn sputtering target with a Sn content of 6 at%. (a) He gas pressure of 300 and 500 mTorr; the distance between the sputtering target and substrate was 20 mm. (b) He gas pressure of 300 mTorr; the distance between the sputtering target and substrate was 10 mm.

Back to article page