Table 1 Experimental results for HfOx and TaOx devices.

From: Material to system-level benchmarking of CMOS-integrated RRAM with ultra-fast switching for low power on-chip learning

Material

CC (µA)

Pulse Amp. (V)

Number of states

P. noise

Conductance (µS)

Accuracy (%)

V+

V−

Avg

SD

Max

Off

On

D.R

HfOx

200

1.2

1.0

12

0.87

14

0.75

76.9

143

1.86

29.4

1.2

1.1

12

1

14

0.73

32.3

143

4.43

82.3

350

1.1

1.1

23

3

28

0.72

45.5

200

4.2

87.4

1.2

1.1

29

4

36

0.73

37.0

200

5.4

89.7

500

1.1

1.1

20

2.8

23

0.68

100

213

2.1

90.5

TaOx

200

1.4

1.3

11

1.2

14

0.68

10.9

100

9.2

92.9

350

1.3

1.3

18

2.98

23

0.73

17.0

128

7.8

89.1

1.4

1.3

27

1.1

29

0.81

8.5

57.5

6.8

84.1

500

1.3

1.3

20

0.6

21

0.74

3.82

167

43.7

90.7

1.4

1.3

35

1.2

37

0.75

9.8

179

18.2

96.4

  1. Significant values are in bold.