Figure 5
From: Fabrication of nanoscale T-shaped reentrant structures and its hydrophobic analysis
Schematic diagram of the fabrication process for T-shaped reentrant nanostructures. (a) Two-step anodization, (b) through-hole AAO membrane fixed on a Si substrate as an evaporation mask, (c) depositing of the Cr nanoparticle array on the Si substrate, (d) selective XeF2 isotropic etching of Si substrate using Cr nanoparticles as a mask, (e) removing Cr nanoparticles.
