Table 2 Major published VO2 based multilayered coatings.
Configuration of the multilayered system | Synthesis technique | Transition temperature (°C) | References |
|---|---|---|---|
V2O3/VO2 | Reactive magnetron sputtering | 72.0 | Long et al.74 |
VO2/TiO2 | Pulsed Laser Deposition | 63.5 | Pellegrino et al.75 |
ITO/VO2/TiO2 | Reactive magnetron Sputtering | 52.0 | Miller and Wang76 |
TiO2/VO2/TiO2 | Medium frequency reactive magnetron sputtering | 61.5 | Zheng et al.77 |
SiO2/VO2 | Spin coating | 61.0 | Wang et al.82 |
V2O3/V (7 nm)/V2O3 | Electron beam Evaporation With a non optimised annealing | 27.9 | Sfundo et al.81 |
V2O3/V(12 nm)/V2O3 | Electron beam Evaporation With a non optimised annealing | 36.9 | Sfundo et al.81 |
VO2/Au/VO2 | Electron beam evaporation | 66.9 | Zhou et al.78 |
V2O5/V/V2O5 | Electron beam evaporation | high-temperature coefficient of resistance | Han et al.79 |
SiO2-TiO2/VO2/ TiO2 | Spin coating | 36.9 | Zhao et al.80 |
WO3/VO2/WO3 | Reactive magnetron sputtering | 54.5 | Long et al.83 |
V2O5/V(7 nm)/V2O5 | Electron beam evaporation | 27.5 | Current work |
V2O5/V12nm)/V2O5 | Electron beam evaporation | 37.5 | Current work |
