Figure 4
From: Lens-free reflective topography for high-resolution wafer inspection

Systematic image analysis based on \({{\text{NA}}}_{{\text{ill}}}\). (a–c) Restoration image (top left) and illumination pattern (bottom left) for each case with \({{\text{NA}}}_{{\text{ill}}}\) values of 0.004, 0.021, and 0.042. The magnified region indicated by the white dotted box is shown on the right-hand side. (d) Line plot graph denoted by white dotted lines in (a–c). (e) \({\text{SNR}}\) (red) and contrast (blue) of the pattern in (d) as a function of \({{\text{NA}}}_{{\text{ill}}}\). An \({\text{SNR}}\) value of 1 indicates a threshold which the pattern cannot be distinguished accurately. (f). Correlation between the ground truth and restored images as a function of \({{\text{NA}}}_{{\text{ill}}}\). The dotted black line represents the linear plot of data points. Based on the theoretical investigations in Methods, the physical quantities reflecting image quality exhibit a linear relationship with \({{\text{NA}}}_{{\text{ill}}}\). In (e) and (f), the analysis was performed by statistically averaging the results using five different random patterns while keeping the same \({{\text{NA}}}_{{\text{ill}}}\) value for each data point.