Figure 1 | Scientific Reports

Figure 1

From: In situ monitoring of thin alumina passive film growth by surface plasmon resonance (SPR) during an electrochemical process

Figure 1

(a) Structure of the simulated diffraction grating with period Λ and the grating depth d. (b) Reflectance response as a function of wavelength under the simulated configuration. In orange, Λ = 375 nm with grating depth d = 36 nm. In blue, Λ = 630 nm with grating depth d = 54 nm. (c) Simulation of the growth af an Al2O3 for both structures.

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