Fig. 2
From: Fabrication and X-ray microtomography of sandwich-structured PEEK implants for skull defect repair
Schematic layout of the synchrotron X-ray microtomography41. The X-ray beam at 15 KeV is monochromatized using a double Si (311) crystal system. A shutter is used to regulate the radiation dose by allowing the beam to pass only when the image forms on the CCD detector. Absorption contrast can be achieved at position I, while materials with similar absorption coefficients have minimum image contrast. To increase image contrast, the detector was moved to position II during the experiment. After propagating for 20 cm, the phase shifts were converted into measurable intensity variations through Fresnel diffraction.
