Fig. 1
From: Surface structuring of glass with submicrometer features using selective laser etching
a Scheme of required process steps for selective laser etching. At first, a-1 the fused silica is structured by the fs-laser. Subsequently, b the structured substrate is placed into a KOH-bath which is heated to 90 \(^{\circ }\) C. Finally, c the substrate is finished by flushing with distilled water.
