Table 1 Investigated process parameter to optimize the surface roughness.
From: Surface structuring of glass with submicrometer features using selective laser etching
Min. | Max. | Best | |
|---|---|---|---|
Energy [nJ] | 300 | 450 | 350 |
Speed [mm/s] | 15 | 20 | 15 |
Pulse distance [nm] | 5 | 40 | 20 |
Spacing [µm] | 0.1 | 10 | 1 |
Rep. rate [kHz] | 600 | 1000 | 700 |
